| 标题 |
Comparative analysis on Gaussian process regression and numerical model for accurate Si 3 N 4 wet etching rate prediction under small training data condition |
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| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Yusuke Hirata; Koki Shibata; Naoko Misawa; Takashi Ota; Yuki Yoshinaga; et al 出版日期:2026-03-05 |
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(2025-6-4)