| 标题 |
Effect of Radio Frequency Power on the Properties of Hydrogenated Amorphous Carbon Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition |
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| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Y. Hayashi; K. Hagimoto; H. Ebisu; Murali Krishna Kalaga; T. Soga; et al 出版日期:2000-07-15 |
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(2025-6-4)