| 标题 |
Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography |
| 网址 | |
| DOI |
10.7567/jjap.50.036504
doi
|
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Craig D. Higgins; Charles R. Szmanda; Alin Antohe; Greg Denbeaux; Jacque Georger; et al 出版日期:2013-12-21 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)