| 标题 |
Metal-oxide resist material and process advancements for positive- and negative-tone high-NA EUV lithography applications |
| 网址 | |
| DOI |
10.1117/12.3090868
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLIII 作者:Alexander C. Marwitz; Jan Doise; Joren Wouters; Matthew Voss; Bradley J. Ryan; et al 出版日期:2026-04-09 |
| 求助人 | |
| 下载 |
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(2025-6-4)