Experiments were conducted on the deposition of diamond films from hydrogen and methane mixtures on silicon substrates by a microwave plasma enhanced chemical vapor deposition technique. Thin films of diamond were obtained. The crystallinity of the films, as determined by electron diffraction, can be controlled and changed from polycrystalline to amorphous. The chemical vapor deposition method of growing diamonds is discussed in a historical perspective in relationship to the optical properties of natural diamonds and to CVD diamond films.