气溶胶
沉积(地质)
三氯氢硅
材料科学
化学工程
单层
表面改性
基质(水族馆)
纳米技术
化学
有机化学
硅
冶金
地质学
古生物学
海洋学
沉积物
工程类
作者
Kamesh Mullapudi,Nishit M. Murari,Ryan H. Mansergh,Douglas A. Keszler,John F. Conley
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2020-12-23
卷期号:39 (1)
被引量:1
摘要
In this work, we demonstrate controlled area-selective deposition of aluminum oxide phosphate (AlPO) at room temperature and near atmospheric pressure using a potentially zero-waste aerosol jet fog (ajFOG) deposition system. Octyl-trichlorosilane (OTS-8) self-assembled monolayers (SAMs) are coated on SiO2/Si substrates to form a blanket hydrophobic functionalization. Next, ultraviolet/ozone exposure through a shadow mask removes OTS-8 in the exposed regions, creating a pattern of hydrophobic and hydrophilic regions. AlPO is selectively deposited onto the hydrophilic regions from an aqueous aerosol precursor fog of aluminum phosphate inorganic clusters. Smooth films with sharp boundaries are deposited. The AlPO features and defects in the hydrophobic areas are investigated as a function of feature size, SAM type/application method/exposure time, ajFOG process parameters, and underlying substrate.
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