Fabrication and Performance of 300-mm Wafer-Scale Silicon Microchannel Cooler

This article describes the design, fabrication, and thermal performance of 300-mm-diameter wafer-scale Si microchannel coolers that demonstrated a junction temperature rise of less than 18 °C when dissipating about 14 kW of power. A thermal test wafer, which included hot-spot regions to mimic high-power compute cores, was attached to the wafer-scale microchannel cooler with Pb–Sn solder. Glass manifold layers were attached to the microchannel wafer using a frit material. The average apparent heat transfer coefficient, $h_{\mathrm {app}}$ , was about 104000 W/(K- $\text{m}^{2}$ ).