材料科学
阳极氧化
原子层沉积
薄膜
钛
无定形固体
氧化铟锡
二氧化钛
图层(电子)
纳米技术
化学工程
复合材料
铝
冶金
结晶学
化学
工程类
作者
Jere Tupala,Marianna Kemell,Emma Härkönen,Mikko Ritala,Markku Leskelä
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2012-03-13
卷期号:23 (12): 125707-125707
被引量:25
标识
DOI:10.1088/0957-4484/23/12/125707
摘要
Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.
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