Characteristics of Thin High Entropy Alloy Films Grown by Pulsed Laser Deposition

X射线光电子能谱 材料科学 薄膜 高熵合金 分析化学(期刊) 扫描电子显微镜 脉冲激光沉积 准分子激光器 氮化物 合金 纳米压痕 化学工程 冶金 激光器 纳米技术 复合材料 光学 化学 物理 工程类 图层(电子) 色谱法
作者
Edwin Alexandru Laszlo,Doina Craciun,Gabriela Dorcioman,Gabriel Crăciun,Victor Geantǎ,Ionelia Voiculescu,Dan Cristea,V. Crăciun
出处
期刊:Coatings [Multidisciplinary Digital Publishing Institute]
卷期号:12 (8): 1211-1211 被引量:16
标识
DOI:10.3390/coatings12081211
摘要

Starting from solid-solutions (SS) of AlCoCrFeNix high-entropy alloys (HEAs) that have been produced with high purity constituent elements by vacuum arc remelting (VAR) method varying the nickel molar ratio x from 0.2 to 2.0, we investigated the synthesis of protective thin films of HEAs and high-entropy nitrides (HENs) with the aid of the pulsed laser deposition (PLD) system. The structure of all ten available bulk targets have been examined by means of X-Ray Diffraction (XRD), as well as their elemental composition by means of energy dispersion X-ray spectroscopy (EDS). Three targets with nickel molar composition x = 0.4, 1.2 and 2.0 corresponding to BCC, mixed BCC and FCC, and finally FCC structures were used for thin film depositions using a KrF excimer laser. The depositions were performed in residual low vacuum (10−7 mbar) and under N2 (10−4 mbar) at room temperature (RT~25 °C) on Si and glass substrates. The deposited films’ structure was investigated using grazing incidence XRD, their surface morphology, thickness and elemental composition by scanning electron microscopy (SEM), EDS and X-ray photoelectron spectroscopy (XPS), respectively. A homemade four-point probe (4PP) set-up was applied to determine layers electrical resistance. Besides, a Nanoindentation (NI) was employed to test films’ mechanical properties. XRD results showed that all deposited films, regardless of the initial structure of targets, were a mixture of FCC and BCC structures. Additionally, the quantitative and qualitative EDS and XPS results showed that the elemental composition of films was rather close to that of the targets. The depositions under an N2 atmosphere resulted in the inclusion of several percentage nitrogen atoms in a metallic nitride type compound into films, which may explain their higher electrical resistivity. The Young’s modulus, nanohardness and friction coefficient values showed that the deposited films present good mechanical properties and could be used as protective coatings to prevent damage in harsh environments.

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