材料科学
电子设备和系统的热管理
热阻
热传导
消散
热的
散热膏
结温
散热片
工作台
热流密度
热撒布器
电子包装
半导体器件
机械工程
大功率led的热管理
炸薯条
功率(物理)
光电子学
被动冷却
水冷
热导率
温度测量
冷却能力
复合材料
模具(集成电路)
热接触电导
集成电路封装
发热
压力(语言学)
传热
冯·米塞斯屈服准则
核工程
机械
接触电阻
电子工程
工作温度
内部加热
功率半导体器件
芯片级封装
作者
Qiang Li,Guisheng Gan,Ruidong Yan,Junfeng Dou,Fangliang Li,Jianing Zhu,Daochun Xie,Daquan Xia,Xiangtao Xu
标识
DOI:10.1109/icept67137.2025.11157446
摘要
This study is based on a highly integrated Dual-Base-Island packaging product, where a clip structure is implemented on the device top to form a double-sided heat dissipation configuration. By integrating thermodynamic simulation analysis results from Ansys Workbench with experimental data, we evaluate the impact of double-sided cooling technology on key thermal and electrical parameters including heat dissipation efficiency, thermal resistance, and RDS(on). Thermal simulation results demonstrate that the Dual-Base-Island double-sided heat dissipation structure exhibits more uniform temperature distribution, with the maximum surface temperature (163.34 °C) located at the clip region - representing a reduction of 12.29 °C compared to the single-sided configuration. High thermal flux regions are concentrated at the clip-to-leadframe bonding interface, effectively establishing dual thermal conduction paths. For internal device characterization, the chip exhibits maximum von Mises stress concentration at the clip contact interface (469.55 MPa). Experimental measurements show that the RDS(on) values of the double-sided cooling device are consistently lower than those of the single-sided counterpart under all tested ambient temperatures, with the differential diminishing as environmental temperature increases. Notably, the Dual-Base-Island packaged device achieves a junction-to-case thermal resistance (Rth(ch-tp)) of 0.95 °C/W, representing an 83.84% reduction, while demonstrating a 20.45% enhancement in maximum power dissipation (2.045 W). These findings conclusively validate that the double-sided heat dissipation packaging technology significantly improves both thermal management efficiency and electrical performance in power semiconductor devices.
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