CMOS芯片
泄漏(经济)
材料科学
硅
位错
电子工程
光电子学
电气工程
计算机科学
工程类
宏观经济学
复合材料
经济
作者
Frank Siegelin,Anton Stuffer
出处
期刊:Proceedings
日期:2005-10-01
卷期号:30880: 59-63
被引量:17
标识
DOI:10.31399/asm.cp.istfa2005p0059
摘要
Abstract With high implant doses, strained silicon technologies and shrinking feature sizes, dislocation related failures seem to gain more importance in advanced CMOS devices. On the basis of case studies, different types of dislocations as well as the electrical characteristics of the corresponding devices will be presented.
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