Ptychography simulations for precisely measuring wavefront profiles in soft x-ray focusing system based on ellipsoidal mirror

In synchrotron radiation facilities, soft X-ray nanofocusing with mirrors remains a hurdle due to difficulties in mirror fabrication. We have been researching the use of ellipsoidal mirrors for soft X-ray nanofocusing. Information on the wavefront errors of focused beams is helpful for improving the focusing system. This study presents ptychographic wavefront measurements for a nanofocusing system with an ellipsoidal mirror. We developed a ptychography program and performed several simulations at 300 eV to investigate the theoretical accuracy of the wavefront measurements. The simulation results indicate that wavefront measurements with high accuracy are possible.