范德瓦尔斯力
扭转
纳米压痕
材料科学
双层
剪切(物理)
单层
分子间力
剪应力
剪切(地质)
凝聚态物理
复合材料
纳米技术
几何学
物理
化学
膜
分子
生物化学
数学
量子力学
作者
Yufei Sun,Yujia Wang,Enze Wang,Bolun Wang,Hengyi Zhao,Yongpan Zeng,Qinghua Zhang,Yonghuang Wu,Lin Gu,Xiaoyan Li,Kai Liu
标识
DOI:10.1038/s41467-022-31685-7
摘要
Abstract The rise of twistronics has increased the attention of the community to the twist-angle-dependent properties of two-dimensional van der Waals integrated architectures. Clarification of the relationship between twist angles and interlayer mechanical interactions is important in benefiting the design of two-dimensional twisted structures. However, current mechanical methods have critical limitations in quantitatively probing the twist-angle dependence of two-dimensional interlayer interactions in monolayer limits. Here we report a nanoindentation-based technique and a shearing-boundary model to determine the interlayer mechanical interactions of twisted bilayer MoS2. Both in-plane elastic moduli and interlayer shear stress are found to be independent of the twist angle, which is attributed to the long-range interaction of intermolecular van der Waals forces that homogenously spread over the interfaces of MoS2. Our work provides a universal approach to determining the interlayer shear stress and deepens the understanding of twist-angle-dependent behaviours of two-dimensional layered materials.
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