材料科学
极化(电化学)
薄膜
纳米尺度
凝聚态物理
氧气
应变工程
电场
纳米技术
光电子学
铁电性
化学物理
电介质
硅
物理化学
有机化学
化学
物理
量子力学
作者
Zhipeng Li,Zeyu Zhang,Jia Liu,Ruixue Zhu,Binghui Ge,Yueliang Li,Xin Zhang,Peng Gao,Dawei Wang,Xiaoguang Xu,Wenhuai Tian,Yong Jiang
标识
DOI:10.1002/aelm.202100876
摘要
Abstract Enhancement of interfacial ferroelectricity is crucial for the development of nanoscale ferroelectric devices, such high density and nonvolatile memory. Although the epitaxial strain can lead to improved properties, the limited choices of substrates and strain relaxation have hindered the further tuning of ferroelectricity by strain engineering. To overcome this limitation, the interaction between polarization and defects is regarded as a potential route to enhance the interfacial polarization. Here, a universal method to achieve a polarization‐enhanced interface by tuning the distribution of oxygen in lead‐free BaTiO 3 films is demonstrated. The interfacial phase processes largely increased c ‐axis lattice constant, tetragonality, and about 100% increasement of Ti atom displacement near interface within thickness of 8 unit cells, suggesting enhancement of spontaneous polarization up to 70 μC cm ‐2 . The gradient distribution of oxygen along c ‐axis is also revealed. In addition, the first‐principle Monte Carlo simulation of the tetragonality and polarization support the experimental results. It is suggested that the inhomogeneity of oxygen and interfacial charges could induce an electric field and further enhance the interfacial polarization. This work provides a new route of utilizing the oxygen distribution to engineer the ferroelectrics and paves the way for the development of nanoscale ferroelectric devices.
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