The chemical vapor deposition of SiO2 from teos

The dissociative adsorption and thermal decomposition of tetraethoxysilane, TEOS, has been studied on Si(1OO) and SiO2. TEOS reacts with either surface at elevated temperatures to produce a mixture of di- and triethoxysiloxanes. These intermediates decompose in vacuum to evolve cthylene and deposit SiO2. Strong similarities are evident in the decomposition of TEOS on both surfaces.