Enabling Effective Work Function Tuning by RFPVD Metal Oxide on High-k Gate Dielectric
作者
Naomi Yoshida,Xianmin Tang,Khaled Z. Ahmed,Melody P. Agustin,Steven C. H. Hung,Victor P. T. Ku,Osbert Chan,Robert F. L. Liang,Hao Chen,Bo Zheng,G. Conti,C. Lazik,Miao Jin,Kishore Lavu,Chorng‐Ping Chang,Tushar Mandrekar,Srinivas Gandikota
出处
期刊:Meeting abstracts [Institute of Physics] 日期:2008-05-05卷期号:MA2008-01 (16): 632-632