The development of a"lower resistance"permanent cathode

The ISA PROCESS Technology (IPT) has now developed a low resistance cathode plate (ISA Cathode BR TM ) in response to market demand . The ISA Cathode BR TM provides lower electrical resistance by decreasing the distance between the end of the copper plating and the solution line . Plant trials in the Townsville ISA PROCESS refinery and in a major Chilean electrowinning plant were undertaken to prove the performance of the new cathode type BR TM . Results to date indicate that significant operating cost savings are available with the use of the ISA Cathode BR TM electrodes .