吸附
成核
氧气
化学物理
扩散
材料科学
结合能
表面能
表面扩散
硅氧烷
Atom(片上系统)
物理化学
化学
计算化学
结晶学
原子物理学
热力学
复合材料
嵌入式系统
物理
有机化学
聚合物
计算机科学
作者
Junjie Wang,Li-tong ZHANG,Qingfeng Zeng,Vignoles L Gérard,A. Guette
标识
DOI:10.1007/s11434-009-0133-3
摘要
We present comprehensive first-principles calculations on the initial stages of SiC oxidation by atomic oxygen on the 2H-SiC(001) surface. In order to study the kinetics of oxygen incorporation at the 2H-SiC(001) surface, we investigated adsorption and diffusion of oxygen atoms and SiO2 nucleation. The adsorption sites, corresponding to the local minima of the potential energy surface (PES) for isolated adatoms, were identified through a comparative study of the adatom binding energy at different locations. We found that the Bridge (siloxane) site is preferred over other adsorption sites. There is no energy barrier at 0K for oxygen insertion into this site. The diffusion energy barriers that the adatom has to overcome when jumping between two adsorption sites were calculated. The premises of silica nucleation were investigated by calculating the modifications of the oxygen atom binding energy due to the interaction with neighboring adatoms.
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