Preparation of TiO2 thin films by reactive evaporation method

Thin films of TiO2were prepared on glass substrates by reactive evaporation of TiO. Properties of the thin films were investigated under ultrahigh vacuum conditions by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). AFM topography exhibits a uniformity structure of the thin films and shows a high quality nanocrystalline structure of TiO2with grain size ranging from 28 nm to 35nm. The XPS Ti-2p spectra confirmed the occurrence of the 4+oxidation state of Ti and the O-1s spectra revealed the presence of an O-2photoelectron peak. The calculated O/Ti ratio in TiO2thin films was in the range 1.85-2.15 depending on the samples. Additional analysis of the thin films was carried out by X-ray powder diffraction (XRD).