Studies on perovskite film ablation and scribing with ns-, ps- and fs-laser pulses

Hybrid organic–inorganic perovskites attract much attention due to their exceptional optoelectronic properties, in particular for photovoltaic (PV) applications. The accurate, high-speed and reliable patterning of the PV films is required for perovskite solar modules fabrication. Laser scribing provides these characteristics needed for industrial fabrication processes. In this work, the laser ablation and scribing of perovskite layers (CH3NH3PbI3: MAPbI3) with different laser sources (ns-, ps-, fs-laser pulses with wavelengths of 248 nm to 2.5 µm) were systematically investigated. The perovskite material was irradiated from both the film side and the substrate (rear side) side to study and compare the particular processes. The patterning results of the perovskite film can be classified into (1) regular laser ablation, (2) thin-film delamination lift-off process, and (3) lift-off with thermal modifications. A particular process, the localised lift-off of single grains from the perovskite film, has been observed and is discussed in relation to the thin-film lift-off process. Ablation and ablation-related mechanisms provide good conditions for laser scribing of the perovskite layer required for module interconnection via P2.