随时间变化的栅氧化层击穿
材料科学
介电强度
磁阻随机存取存储器
凝聚态物理
电介质
压力(语言学)
阿累尼乌斯方程
磁电阻
电压
活化能
电气工程
光电子学
化学
物理
栅极电介质
磁场
工程类
计算机科学
计算机硬件
量子力学
哲学
语言学
晶体管
有机化学
随机存取存储器
作者
Joel Tan,Jia Hao Lim,Bejoy Sikder,Md Zunaid Baten,Jae Hyun Kwon,Kazutaka Yamane,V. B. Naik,Nagarajan Raghavan,K. L. Pey
标识
DOI:10.1109/ted.2022.3220485
摘要
Time-dependent dielectric breakdown (TDDB) lifetime of ultrathin (1 nm) MgO in spin-transfer torque magnetoresistive random access memory (STT-MRAM) devices has recently been shown to be driven by factors other than voltage alone. This study focuses on the specific role of asymmetry in the current flow for different polarity pulsing modes of voltage stress on the TDDB lifetime of 1-nm MgO. Numerical analysis, based on a 3-D heat-diffusion equation and spintronic simulations, has been performed to characterize the temperature rise in the devices for precise correction of self-heating to obtain a correct interpretation of MgO TDDB. It is shown that the different lifetimes for the positive and negative modes can be attributed to different temperature increases arising from self-heating. While the positive and negative modes displayed a non-Arrhenius behavior, the bipolar mode showed an Arrhenius trend in which we observed a unique bimodal behavior of TDDB activation energy ( ${E}_{\text {a}}$ ) as a function of stress voltage in the ultrathin MgO stack. We discuss the role of additional driving forces, such as current, self-heating, charge trapping, and interface strain governing the breakdown mechanism along with the voltage effect.
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