Preparation of Magnesium Hydroxide Film by Electrochemical Reaction

Mg(OH)2 films with hexagonal structure were grown on a conductive substrate by electrochemical deposition from a 0.1mol/L magnesium nitrate aqueous solution kept at 323K. The crystal structure of these films corresponded to the hexagonal structure with the space group of P3m1 as determined by using Rietveld analysis, regardless of the cathodic potential. The resistivity of Mg(OH)2 films decreased with an increase in the cathodic potential. In particular, at the cathodic potential of -0.9V, Mg(OH)2 films had the resistivity as low as 1.1Ωcm. This film was composed of aggregates of triangular grains and had no defects such as pores and cracks.