材料科学
余辉
发光
闪烁体
闪烁
结晶度
激发态
光电子学
产量(工程)
纳米技术
氟化物
热稳定性
放射发光
纳米颗粒
光学
强度(物理)
复合数
还原(数学)
作者
X Xu,Wenying Xu,X D Liu,Renren Deng,Min Zhou,Zicheng Wen,Jianrong Qiu
摘要
ABSTRACT The development of scintillators that combine strong X‐ray excited optical luminescence (XEOL) with minimal afterglow is pivotal for advancing dynamic X‐ray imaging applications. Herein, we report a facile strategy for the simultaneous optimization of scintillation properties in NaLuF 4 :Tb/Gd nanoscintillators (NSs) through precise control of co‐precipitation temperature. Elevating the reaction temperature from 300°C to 320°C yields a monotonic enhancement in XEOL intensity along with a significant reduction in X‐ray excited persistent luminescence (XEPL). This synergistic effect is attributed to temperature‐induced improvement in crystallinity and a substantial decrease in the number of charge‐trapping defects. The optimized NaLuF 4 :Tb/Gd NSs were fabricated into a flexible composite film, which exhibits excellent stability and enables high‐resolution (14.1 lp mm −1 ) dynamic X‐ray imaging. This work provides a scalable pathway for optimizing scintillation yield while suppressing afterglow in fluoride NSs.
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