Sufficient conditions for the identification of defects which exhibit no generalized cross‐section using computed electron micrographs

Sufficient conditions are developed that determine how many computed electron micrographs need to be matched to actual electron micrographs to ensure unique identification of observed lattice defects. This work focuses on defects without generalized cross-sections, such as force dipoles, inclusions, and small dislocation loops. The sufficient conditions given may be incorporated readily into computer programmes used to generate simulated micrographs.