X射线光电子能谱
材料科学
扫描电子显微镜
兴奋剂
化学气相沉积
钛
薄膜
透明导电膜
氟
基质(水族馆)
分析化学(期刊)
化学工程
纳米技术
化学
冶金
光电子学
复合材料
有机化学
工程类
海洋学
地质学
作者
Iqra Ramzan,Joanna Borowiec,Ivan P. Parkin,Claire J. Carmalt
标识
DOI:10.1002/cplu.202400073
摘要
Aerosol-assisted chemical vapor deposition (AACVD) was used to deposit highly transparent and conductive titanium or fluorine-doped and titanium-fluorine co-doped ZnO thin films on glass substrate at 450 oC. All films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), UV-Vis spectroscopy, scanning electron spectroscopy (SEM), and four-point probe. The films were 600-680 nm thick, crystalline, and highly transparent (80-87%). The co-doped film consisted of 0.70 at.% titanium and 1 at.% fluorine, and displayed a charger carrier mobility, charge carrier concentration, and a minimum resistivity of 8.4 cm2 V-1 s-1, 3.97 x 1020 cm-3, and 1.69 x 10-3 Ω cm, respectively. A band gap of 3.6 eV was observed for the co-doped film. Compared to the undoped and singly doped films, the co-doped film displayed a notably higher structure morphology (more homogenous grains with well-defined boundaries) suitable for transparent conducting oxide applications.
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