材料科学
氧化镓
光电子学
二极管
带隙
宽禁带半导体
晶体管
镓
电流(流体)
氮化镓
功率半导体器件
半导体
功率(物理)
电力电子
数码产品
纳米技术
工程物理
电气工程
物理
冶金
工程类
图层(电子)
电压
量子力学
作者
Masataka Higashiwaki,Hisashi Murakami,Yoshinao Kumagai,Akito Kuramata
标识
DOI:10.7567/jjap.55.1202a1
摘要
Abstract Gallium oxide (Ga 2 O 3 ) is an emerging wide-bandgap semiconductor for high-power, low-loss transistors and diodes by virtue of its excellent material properties and suitability for mass production. In this paper, we begin by discussing the material properties of Ga 2 O 3 that make it an attractive alternative to not only Si but also other wide-bandgap materials such as SiC and GaN. State-of-the-art Ga 2 O 3 -based devices that have been fabricated to date demonstrate the performance potential for power electronics applications.
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