UV Destruction of Phenolic Compounds under Alkaline Conditions

This study provides data showing the range of conditions under which phenols and substituted phenols can be oxidatively destroyed using UV-H2O2. UV-H2O2 was found to be considerably more effective in destroying phenol and substituted phenols than UV. Significant reaction rates were seen at lamp outputs of 60,000 and 240,000 uW-sec/cm2 over a phenol concentration range of 10-1000 mg/L, a pH range 4-10 and mole ratios of H2O2/Phenol of 2.8/1 to 8.3/1. By being effective under alkaline as well as acid conditions, UV-H2O2 avoids the acid limitations of Fenton's reagent (Fe + H2O2) which is a well know chemistry used for destroying phenolic compounds.