UV Destruction of Phenolic Compounds under Alkaline Conditions
作者
H. M. Castrantas,R.D. Gibilisco
出处
期刊:Acs Symposium Series [American Chemical Society] 日期:1990-03-08卷期号:: 77-99被引量:21
标识
DOI:10.1021/bk-1990-0422.ch006
摘要
This study provides data showing the range of conditions under which phenols and substituted phenols can be oxidatively destroyed using UV-H 2 O 2 . UV-H 2 O 2 was found to be considerably more effective in destroying phenol and substituted phenols than UV. Significant reaction rates were seen at lamp outputs of 60,000 and 240,000 uW-sec/cm 2 over a phenol concentration range of 10-1000 mg/L, a pH range 4-10 and mole ratios of H 2 O 2 /Phenol of 2.8/1 to 8.3/1. By being effective under alkaline as well as acid conditions, UV-H 2 O 2 avoids the acid limitations of Fenton's reagent (Fe + H 2 O 2 ) which is a well know chemistry used for destroying phenolic compounds.