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30 积分 2023-10-27 加入
Chapter 7 The study of thermal nitridation and reoxidation mechanisms using isotopic tracing methods
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The formation of ultrathin silicon oxide films using H2/N2O mixtures
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Advances in Rtp Temperature Measurement and Control
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Study of the radiative properties of silicon-based materials for thermal processing and control
29天前
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Rapid thermal processing in semiconductor technology
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Modeling of the gate leakage current reduction in MOSFET with ultra-thin nitrided gate oxide
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Impact of post-nitridation annealing on ultra-thin gate oxide performance
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Extraction Method for Equivalent Oxide Thickness of a Thin High-κ Gate Insulator and Estimation of Field-Effect Mobility in Amorphous Oxide Semiconductor Nano-Sheet Junctionless Transistors
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Characterization of ultrathin gate dielectrics formed by in-situ steam generation with nitrogen postprocessing
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