| 标题 |
Mo2N as a novel barrier layer to mitigate interface imperfection in (Mo/Si)-based soft x-ray multilayer mirror |
| 网址 | |
| DOI |
10.1117/12.3118536
doi
|
| 其它 |
期刊:Photomask Japan 作者:S. Haque; Yuta Fujisawa; Shunya Uji; M. Toyoda 出版日期:2026-09-23 |
| 求助人 | |
| 下载 |
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(2025-6-4)