| 标题 |
Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Romel Hidayat; Khabib Khumaini; Hye-Lee Kim; Tanzia Chowdhury; Tirta Rona Mayangsari; et al 出版日期:2023-04-26 |
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(2025-6-4)