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[高分]
Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists |
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| DOI | |
| 其它 |
期刊:IEICE Transactions on Electronics 作者:Itaru Kamohara; Ulrich Welling; Ulrich Klostermann; Wolfgang Demmerle 出版日期:2021-08-05 |
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(2025-6-4)