Optical properties of silica antireflective films formed in sol‐gel processes

Abstract The work presents optical properties of sol‐gel derived porous silica films of low refractive index, from 1.2 to 1.3. Due to low refractive index, the porous silica films can be applied to reduce the light reflection coefficient. This allows porous silica films as good candidates for the antireflective coatings (ARC) production. The spectroscopic ellipsometric measurements have been performed for the refractive indices and thickness of silica films determination. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)