材料科学
异质结
云母
范德瓦尔斯力
半导体
氧化物
光电子学
石墨烯
纳米技术
复合材料
冶金
分子
有机化学
化学
作者
Chengyun Hong,Ye Tao,Anmin Nie,Minhao Zhang,Nan Wang,Ruiping Li,Junquan Huang,Yongqing Huang,Xiaomin Ren,Yingchun Cheng,Xiaolong Liu
出处
期刊:ACS Nano
[American Chemical Society]
日期:2020-11-18
卷期号:14 (12): 16803-16812
被引量:82
标识
DOI:10.1021/acsnano.0c05300
摘要
As an emerging ultrathin semiconductor material, Bi2O2Se exhibits prominent performances in electronics, optoelectronics, ultrafast optics, etc. However, until now, the in-plane growth of Bi2O2Se thin films is mostly fulfilled on atomically flat mica substrates with interfacial electrostatic forces setting obstacles for Bi2O2Se transfer to fabricate functional van der Waals heterostructures. In this work, controlled growth of inclined Bi2O2Se ultrathin films is realized with apparently reduced interfacial contact areas upon mica flakes. Consequently, the transfer of Bi2O2Se could be facile by overcoming weaker electrostatic interactions. From cross-sectional characterizations at the Bi2O2Se/mica interfaces, it is found that there are no oxide buffer layers in existence for both in-plane and inclined growths, while the un-neutralized charge density is apparently decreased for inclined films. By mechanical pressing, inclined Bi2O2Se could be transferred onto SiO2/Si substrates, and back-gated Bi2O2Se field effect transistors are fabricated, outperforming previously reported in-plane Bi2O2Se devices transferred with the assistance of corrosive acids and adhesive polymers. Furthermore, Bi2O2Se/graphene heterostructures are fulfilled by a probe tip to fabricate hybrid phototransistors with pristine interfaces, exhibiting highly efficient photoresponses. The results in this work demonstrate the potential of inclined Bi2O2Se to act as a building block for prospective van der Waals heterostructures.
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