极紫外光刻
材料科学
微观结构
透射电子显微镜
热稳定性
图层(电子)
表征(材料科学)
化学工程
纹理(宇宙学)
光电子学
复合材料
纳米技术
计算机科学
图像(数学)
工程类
人工智能
作者
S. Bajt,Z. R. Dai,Erik J. Nelson,M. A. Wall,Jennifer Alameda,Nhan Nguyen,Sherry L. Baker,Jeffrey C. Robinson,John S. Taylor,Miles Clift,Andrew Aquila,Eric M. Gullikson,N. V. Edwards
摘要
Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.
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