抛光
粘弹性
化学机械平面化
材料科学
非线性系统
压缩(物理)
复合材料
弹性(物理)
粘度
机械工程
工程类
物理
量子力学
作者
Norikazu Suzuki,Akimitsu Kato,Masakazu Asaba,Eiji Shamoto
标识
DOI:10.7567/jjap.53.05gb01
摘要
Polishing pads used for chemical mechanical polishing (CMP) process have strong nonlinear viscoelasticity, which is considered to affect resultant polishing performance. In order to evaluate the material properties of polishing pads, a series of fundamental compression tests were conducted by using a developed on-machine compression tester. From measured stress–strain curves, parameters representing nonlinear elasticity and viscosity of the CMP pads are identified. Analytical results indicated unique nonlinear elasticity due to pad surface asperities and not negligible viscous damping.
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