MOSFET
功率MOSFET
材料科学
光电子学
电容
稳健性(进化)
击穿电压
电气工程
工艺CAD
电子工程
电压
工程类
物理
化学
晶体管
计算机辅助设计
基因
量子力学
电极
生物化学
工程制图
作者
Marina Ruggeri,Patrick Calenzo,Frédéric Morancho,L. Masoero,Rosalia Germana,Alessandro Nodari,Richard Monflier
标识
DOI:10.1109/ispsd57135.2023.10147489
摘要
In this paper, we investigated the drain to source breakdown voltage (BV dss ) instability during avalanche current drain stress of Shielded Gate MOSFET (SG-MOSFET) structure and we propose a new methodology to correlate electrical results to TCAD simulations. The presence of positive charged states at the Field Plate (FP) oxide/Si interface was confirmed by Capacitance Deep Level Transient Spectroscopy (C-DLTS). Thus, it was implemented in TCAD simulations that predict the experimental behavior of two architectures. Thanks to these results, walk-in contributors were discriminated to suggest a pathway to increase device robustness with a slight Ron impact.
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