期刊:Electronics Letters [Institution of Engineering and Technology] 日期:2011-08-04卷期号:47 (16): 930-931被引量:20
标识
DOI:10.1049/el.2011.1695
摘要
Large-area metal–semiconductor–metal (MSM) solar-blind photodetectors with a device area of 5×5 mm2 have been fabricated on Al0.4Ga0.6N/AlN/sapphire epistructure. The photodetector exhibits ultra-low dark current density of 3.2×10−12 A/cm2 under 20 V bias and a corresponding breakdown voltage of up to 385 V. The solar-blind/ultraviolet rejection ratio of the photodetector is more than four orders of magnitude with a maximum quantum efficiency of 28% at 275 nm.