异质结
外延
电子迁移率
费米气体
材料科学
电介质
凝聚态物理
电子
宽禁带半导体
晶格常数
极化(电化学)
光电子学
化学
图层(电子)
纳米技术
光学
物理
物理化学
量子力学
衍射
作者
Joseph Casamento,Thai‐Son Nguyen,Yong-Jin Cho,Chandrashekhar Savant,T. Vasen,Shamima Afroz,Daniel Hannan,Huili Grace Xing,Debdeep Jena
摘要
AlScN is attractive as a lattice-matched epitaxial barrier layer for incorporation in GaN high electron mobility transistors due to its large dielectric constant and polarization. The transport properties of polarization-induced two-dimensional (2D) electron gas of densities of ∼2×1013/cm2 formed at the AlScN–GaN interface is studied by Hall-effect measurements down to cryogenic temperatures. The 2D electron gas densities exhibit mobilities limited to ∼300 cm2/V s down to 10 K at AlScN/GaN heterojunctions. The insertion of a ∼2 nm AlN interlayer boosts the room temperature mobility by more than five times from ∼300 cm2/V s to ∼1573 cm2/V s, and the 10 K mobility by more than 20 times to ∼6980 cm2/V s at 10 K. These measurements provide guidelines to the limits of electron conductivities of these highly polar heterostructures.
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