Characterizing Surface Roughness Using the Extreme Ultraviolet

I am doing my research in the extreme ultraviolet (EUV). There are many applications that utilize the EUV. One of those applications is photolithography. Photolithography is the process of etching a design into a substrate using light which is used in the production of computer chips. Currently it is possible to use visible and ultraviolet light in the process of photolithography. Using EUV in photolithography would enable us to make smaller computer chips than we are currently able to develop. In past years the field of astrophysics has grown to utilize many areas of the electromagnetic spectrum. The EUV has recently become a useful tool to astrophysicists. In March 2000 a satellite was launched as part of the IMAGE mission to image the magnetosphere of the earth in the EUV. One of the specific goals of this mission was to study the 30.4 nm line of the earth’s magnetosphere which is part of the EUV. This was only possible due to the development of carefully engineered mirrors that were able to reflect the 30.4 nm line and absorb other wavelengths [1]. This gave astrophysicists a new tool to study outer space. These are just a couple of the many applications of EUV research.