钝化
硅
电解质
X射线光电子能谱
锂(药物)
氧化物
动力学
聚合物
化学反应
化学
无机化学
材料科学
氧化硅
化学工程
物理化学
纳米技术
有机化学
电极
图层(电子)
物理
医学
氮化硅
量子力学
内分泌学
工程类
作者
E. Peled,Dan Schneier,Y. Shaham,G. Ardel,L. Burstein,Yosef Kamir
摘要
Here, we studied for the first time the kinetics of the chemical reactions between oxide-free silicon and electrolytes and the composition and morphology of the surface film formed during these reactions. We found that the kinetics of these reactions is swift; a few nm passivating film is formed during a few milliseconds and a complete passivation takes place in about 30 seconds. XPS study show a passivating film consisting of large organic molecules or polymers containing C-O, C=O, C-Fx and O-C-F moieties, SiFx, SiOxFy, some SiO2 and small amounts of LiF. Containing only traces of Li, it cannot serve as an SEI and may lead to lesser uniformity of the SEI formed on top of it.
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