Stay away from minimum design-rule values [DFM in ultra-deep submicron processes]

The use of non-minimum design-rule values will be an important aspect of design for manufacturability in future ultra-deep submicron (UDSM) processes. EDA tools can and must assist in realizing appropriate design flows. Wire spreading and layout compaction tools are available today to implement preferred design-rule values on mask-layouts for enhanced manufacturability. The area of verification for manufacturability needs to be explored in the near future.