材料科学
电致变色
薄膜
透射率
化学工程
溅射
兴奋剂
电化学
钛
光电子学
电极
分析化学(期刊)
溅射沉积
纳米技术
冶金
有机化学
工程类
物理化学
化学
作者
Meng Peng,Youzhao Zhang,Y.-Z. Zhang,Lixin Song,Liping Wu,Y.-L. Zhang,Y.-L. Zhang,Xuemei Hu
标识
DOI:10.1080/02670844.2016.1255405
摘要
Pure, 5% Ti-doped and 10% Ti-doped WO 3 thin films were prepared by the radio frequency magnetron sputtering and characterised by a SEM, an electrochemical workstation and an UV–VIS–NIR spectrophotometer. Research results showed that Ti doping had no apparent influence on the surface morphology and optical band gap. It could also be found that the addition of Ti has little interference with the electrochromic property of WO 3 in both bleached and coloured states at initial cycles from electrochemical and optical test results, while there were apparent differences in the optical transmittance and inserted and extracted charge with increasing cycles. This is attributed that Ti-doped WO 3 thin films allow facile ion interaction/extraction and have less ion residues, which can stabilise the electrochemical cycling performance. Furthermore, the data we have obtained indicate that 5% Ti-doped WO 3 film has the best electrochromic property.
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