N2/NF3 분리용 폴리썰폰 중공사막 제조 연구

Fabrication of polysulfone (PSf) hollow fiber membranes was investigated for the separation of N2/NF3 gas mixtures, which are emitted from the display and the semiconductor industries. A combination of the non-solvent induced phase separation (NIPS) and the vapor-induced phase separation (VIPS) technique was applied to develop high flux hollow fiber membranes. Thin polymer layers were further coated onto the surface of the hollow fiber membranes by using polydimethylsiloxiane (PDMS) or Teflon AF1600®, which contributes to improve the N2/NF3 selectivity. The N2/NF3 separation performances of our PSf hollow fiber membranes were determined by the intrinsic properties of coating materials. Especially, the PSf hollow fiber membrane coated with Teflon AF 1600® exhibited a higher N2/NF3 selectivity (> 14) with a slightly lower N2 permeance (4.5 GPU), as compared to the commercial PSf counterparts. This feature provides a good potential as a membrane structure to separate N2/NF3.