钛
材料科学
钻石
猝灭(荧光)
碳化钛
化学工程
类金刚石碳
碳纤维
粘附
图层(电子)
纳米技术
复合材料
冶金
薄膜
光学
复合数
工程类
物理
荧光
作者
Lama Osman,Abdelrahman Zkria,Ali M. Ali,Satoki Nagano,Hiroshi Naragino,Tsuyoshi Yoshitake
标识
DOI:10.35848/1882-0786/acdfb7
摘要
Abstract We report on negative bias-enhanced growth of quenched-produced diamond films on titanium using hybrid coaxial arc plasma deposition at room temperature. Optimizing the bias voltage to −40 V resulted in a spontaneous formation of a titanium carbide interfacial layer, which caused a significant increase in the adhesion strength from 16 to 48 N. Selective etching of undesired sp 2 –C bonded atoms and ultrafast quenching of the energetic carbon ions (C + ) promoted the growth of dense sp 3 –C bonded atoms, achieving a superhardness of 96 GPa, comparable to natural diamond. These pioneering findings have the potential to revolutionize multifunctional materials for biomedical applications.
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