Characterisation of nickel germanide formed on amorphous and crystalline germanium

Nickel germanide formed on amorphous and crystalline germanium is investigated for material and electrical properties. The crystal quality of films formed is poorer for the germanides formed on amorphous germanium with a slight increase in sheet resistance. The grains of NiGe formed on amorphous germanium show a growth that is hexagonal like, extending into the substrate further than germanides grains formed on crystalline germanium. The NiGe formed on crystalline germanium has a much more uniform thickness and uniform grain size and shape. Hollow cone illumination shows that some recrystallisation of the amorphised region of germanium does occur.