光致聚合物
光引发剂
芳烯
高分子化学
聚砜
丙烯酸酯
材料科学
聚合
聚合物
预聚物
三羟甲基丙烷
砜
丙烯酸酯聚合物
乙醚
单体
化学
聚氨酯
有机化学
复合材料
芳基
烷基
作者
Cody W. Weyhrich,John W. Will,Katherine V. Heifferon,James R. Brown,Clay B. Arrington,Viswanath Meenakshisundaram,Christopher B. Williams,Timothy E. Long
标识
DOI:10.1002/macp.202200240
摘要
Abstract Vat photopolymerization (VP) is an advanced additive manufacturing (AM) platform that enables production of intricate 3D monoliths that are unattainable with conventional manufacturing methods. In this work, modification of amorphous poly(arylene ether sulfone)s (PSU) allows for VP printing. Post‐polymerization telechelic functionalization with acrylate functionality yielded photocrosslinkable PSUs across a molecular weight range. 1H NMR spectroscopy confirms chemical composition and quantitative acrylate functionalization. Addition of diphenyl‐(2,4,6‐trimethylbenzoyl)phosphine oxide (TPO) photoinitiator to 30 wt% PSU solutions in NMP provides a photocurable composition. However, subsequent photorheological studies elucidate rapid photodegradation of the polysulfone main chain, which is especially apparent in high Mn (15 kg mol−1) PSU formulations. UV‐light intensity and wavelength range are altered to reduce degradation while allowing for efficient crosslinking. The addition of 0.5 wt% of avobenzone photoblocker produces an ill‐defined structure with 6 kg mol−1 PSU. For higher molecular weights (>12 kg mol−1), solutions with a low molar mass reactive diluent, i.e., trimethylolpropane triacrylate, enable the printing of an organogel with a storage modulus (>105 Pa) sufficient for vat photopolymerization. Employing multicomponent solutions provide well‐defined parts with complex geometries through vat photopolymerization.
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