| 标题 |
Composition optimization of HfxZr1-xO2 thin films to achieve the morphotrophic phase boundary for high-k dielectrics |
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| DOI | |
| 其它 |
期刊:Journal of Applied Physics 作者:Seungyeol Oh; Hojung Jang; Hyunsang Hwang 出版日期:2023-04-17 |
| 求助人 | |
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(2025-6-4)