| 标题 |
Polymer sequence alters sensitivity and resolution in chemically-amplified polypeptoid photoresists |
| 网址 | |
| DOI |
10.1117/12.3051105
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLII 作者:Cameron P. Adams; Carolyn Henein; Chenyun Yuan; Christopher K. Ober; Rachel A. Segalman 出版日期:2025-04-22 |
| 求助人 | |
| 下载 | 暂无链接,等待应助者上传 |
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(2025-6-4)