| 标题 |
Experimental verification of sub-resolution grating on a low-n mask using high-NA extreme ultraviolet lithography |
| 网址 | |
| DOI |
10.1117/1.jmm.25.4.041803
doi
|
| 其它 |
期刊:Journal of Micro/Nanopatterning, Materials, and Metrology 作者:Inhwan Lee; Guillaume Libeert; Nick Pellens; Vicky Philipsen; Stefan De Gendt 出版日期:2026-08-04 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
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(2025-6-4)