| 标题 |
Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography |
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| DOI | |
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Yasuharu Tajima; Kazumasa Okamoto; Takahiro Kozawa; Seiichi Tagawa; Ryoko Fujiyoshi; et al 出版日期:2011-06-01 |
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(2025-6-4)